iCVC
“Plasma Cleaning, Surface Modification and Plasma Coating”
iCVC
iCVC Standard Features
Applicable to
various materials
and shapes
Easy to operate
precursor
evaporator
Manufacture of SiOx,
SiNx, TiOx, TiNx,
AlOx, Transparent
Conducting Oxide
(TCO) Etc
Possible to coat
in an organic
thin film
Self-diagnosis
enable highly
stable
atmospheric-pre
ssure plasma
Interface with
external devices
and real-time
plasma monitoring
Apply optimized
power supply,
high frequency
transformers and
plasma hardware
Possible to operate
continuous
operation and
ON/OFF operation
Application
Specification